Extreme-ultraviolet (EUV) lithography involves wavelengths of 13.5 nm, and thus represents the next significant step in the reduction of feature sizes on integrated circuits. However, the move ...

1). Figure 1: Since the mid-1980s, the wavelength of light used in lithography systems has reduced by almost half from 365 nm to 193 nm. Extreme ultraviolet (EUV) lithography is the next step in ...

With EUV, the wavelengths of the lithography printers are 14 times smaller than DUV, at only 13.5 nm, compared to 193 nm of ArF immersion DUV systems... As an example, Intel tried to use SAQP in ...

Unlike CO2 lasers that operate at a wavelength of about 10 microns, this system operates at around 2 microns, according to ...

ASML, meanwhile, is shipping its first production EUV scanner. In EUV, a power source converts plasma into photons at 13.5nm wavelengths. Then the light bounces off a scheme of 10 multi-layer mirrors.